FIB-SEM 3D tomography for measuring shape deviations of HAR structures
US12288705B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Mar 29, 2022 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | May 22, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A 3D tomographic inspection method for the inspection of semiconductor features in an inspection volume of a semiconductor wafer includes obtaining a 3D tomographic image, and selecting a plurality of 2D cross section images. The method also includes identifying contours of HAR structures, and extracting deviation parameters. The deviation parameters describe fabrication errors such as displacement, deviation in radius or diameter, area or shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.