Methods and apparatus for processing a substrate
US12368024B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2021 |
| Grant date | Jul 22, 2025 |
| Priority date | — |
| Expiry date | Dec 15, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.