Method for cleaning a chamber
US12417902B2 · kind B2 · utility
0Cited by
3References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2021 |
| Grant date | Sep 16, 2025 |
| Priority date | — |
| Expiry date | Dec 19, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N50/01
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for cleaning a plasma processing chamber comprising one or more cycles is provided. Each cycle comprises performing an oxygen containing plasma cleaning phase, performing a volatile chemistry type residue cleaning phase, and performing a fluorine containing plasma cleaning phase.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.