Dry development of photoresist
US4882008A · kind A · utility
42Cited by
2References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 8, 1988 |
| Grant date | Nov 21, 1989 |
| Priority date | — |
| Expiry date | Jul 8, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/265
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for developing a photolithographic pattern on the surface of an exposed workpiece in a process chamber; disposing the workpiece in a process chamber; heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; generating activated species from a source of oxygen; and introducing the activated species to the face of the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.