Particle monitor system and method
US5083865A · kind A · utility
29Cited by
9References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 1990 |
| Grant date | Jan 28, 1992 |
| Priority date | — |
| Expiry date | May 11, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/157
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A particle monitor for a processing chamber exhaust line is disclosed which incorporates exhaust line heating, purge gas flow over surfaces such as optical windows in the exhaust gas line, and a thermally and electrically insulating particle monitor mounting arrangement. The features collectively protect the particle monitor from electrical disturbance and from the heated inlet and maintain the optical surfaces clean and free of depositions from the exhaust gas flow for an extended period. The arrangement also suppresses etching of the optical surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.