Apparatus for cleaning silicon wafer
US5186192A · kind A · utility
39Cited by
6References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 10, 1991 |
| Grant date | Feb 16, 1993 |
| Priority date | — |
| Expiry date | Dec 10, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Device for cleaning silicon wafers having an upper mist-generating chamber with a high frequency oscillator to generate an aqueous hydrofluoric acid mist and a lower region processing chamber separated by a partitioning wall having a shutter to open and close. Silicon wafers are held in an upright position in a rack. The processing chamber and the shutter have gas jets to eject gas between the silicon wafers and water spray heads in the processing chamber to spray water between the silicon wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.