Support table for plate-like body and processing apparatus using the table
US5221403A · kind A · utility
46Cited by
2References
20Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 18, 1991 |
| Grant date | Jun 22, 1993 |
| Priority date | — |
| Expiry date | Jul 18, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A wafer support table is provided in a vacuum chamber of a magnetron plasma etching apparatus. This support table includes a first member having a mechanism for adjusting the temperature of a wafer, a second member having an electrostatic chuck for supporting the wafer on its upper surface, and a gas supply mechanism for supplying a gas between the first and second members.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.