Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups
US5238773A · kind A · utility
3Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 1992 |
| Grant date | Aug 24, 1993 |
| Priority date | — |
| Expiry date | Jun 8, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0755
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition containing an organosilicon material having terminal quinone groups, and a phenolic-novolak polymer, and use thereof in photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.