Method for cleaning the surface of a substrate with plasma
US5252181A · kind A · utility
24Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 1991 |
| Grant date | Oct 12, 1993 |
| Priority date | — |
| Expiry date | Dec 17, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F4/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Method for cleaning, with plasma, the surface of a substrate before another treatment, consisting: PA1 in a first cleaning step, in negatively polarizing the substrate and in subjecting it to an argon plasma, and PA1 in a second cleaning step, in subjecting the pretreated substrate to a hydrogen plasma, in order to ensure an efficient cleaning of the surface of the substrate. Application to the prior cleaning of a silicon substrate intended to receive an epitaxy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.