CVD platen heater system utilizing concentric electric heating elements
US5294778A · kind A · utility
562Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 1991 |
| Grant date | Mar 15, 1994 |
| Priority date | — |
| Expiry date | Sep 11, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4586
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A wafer support platen heating system for low pressure chemical vapor deposition of apparatus includes multiple resistance heaters for individual heating of multiple portions of the platen to provide a predetermined uniform or non-uniform temperature gradient/profile across the platen. The multiple graphite resistance heaters of the preferred embodiment include a spiral shaped main resistance heater and two single turn edge loss graphite resistance heaters located within the inner diameter and along the periphery of the outer diameter respectively of the main spiral shaped resistance heater.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.