Dry developable photoresist compositions and method for use thereof

US5322765A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Nicholas J. Clecak · San Jose, US
• Willard E. Conley · San Diego, US
• Ranee W. Kwong · Wappingers Falls, US
• Leo L. Linehan · Blooming Grove, US
• Scott A. MacDonald · San Jose, US
• Harbans S. Sachdev · Wappingers Falls, US
• Hubert Schlosser · Hofheim, DE
• Carlton G. Willson · Austin, US

Key dates

• Filing date: Nov 22, 1991
• Grant date: Jun 21, 1994
• Expiry date: Nov 22, 2011

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/265
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.