Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem
US5362328A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 1994 |
| Grant date | Nov 8, 1994 |
| Priority date | — |
| Expiry date | Jan 7, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/88
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A means and method for protecting a source reagent vaporizer structure from the harmful effects of solid build-up occurring during its use in chemical vapor deposition (CVD). Vaporizer structures may be used to provide a means of transferring relatively involatile source reagents or reagent solutions into CVD reactors and often are high surface area, highly efficient heat transfer structures. When vaporizers are used in CVD, often some premature decomposition of the source reagent occurs on the vaporizer element as well as some oxidative decomposition to produce solid products which cause clogging and inefficient vaporization. The invention provides both apparatus and method to periodically flush clean such vaporizer elements to increase their consistency, reliability, and average time between servicings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.