Method of limiting sticking of body to susceptor in a deposition treatment

US5380566A · kind A · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Robert Robertson · Palo Alto, US
• Marc M. Kollrack · Alameda, US
• Angela Lee · Sunnyvale, US
• Kam S. Law · San Jose, US
• Dan Maydan · Los Altos Hills, US

Key dates

• Filing date: Jun 21, 1993
• Grant date: Jan 10, 1995
• Expiry date: Jun 21, 2013

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/509
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method of limiting sticking of a body (substrate) to a susceptor after the body has been coated with a layer in a deposition chamber by plasma chemical vapor deposition includes subjecting the coated body to a plasma of an inactive gas, e.g., hydrogen, nitrogen, argon or ammonia, which does not adversely affect the coating and does not add additional layers to the body. After the coated body is subjected to the plasma of the inactive gas, the body is separated from the susceptor.