Tunnel effect acceleration sensor
US5431051A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1994 |
| Grant date | Jul 11, 1995 |
| Priority date | — |
| Expiry date | Mar 29, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01P15/0894
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An acceleration sensor is produced on a silicon substrate by etching to leave a cantilevered beam of polysilicon with a tip on the substrate projecting toward this beam. Acceleration of the sensor causes the beam to bend, thereby changing the spacing between the tip and the beam, and thereby also changing the tunnel current, which is measured. Electrodes are provided that, given application of a potential thereto, effect an electrostatic compensation of the bending of the beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.