Apparatus for processing substrates having a film formed on a surface of the substrate
US5565034A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Oct 28, 1994 |
| Grant date | Oct 15, 1996 |
| Priority date | — |
| Expiry date | Oct 28, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus according to this invention includes an interface section having a first transfer member for transferring an object from a coating process section for applying a process solution to the object in accordance with a single sheet process to an object holding member, and a moving member for detachably supplying a plurality of object holding member and simultaneously moving the plurality of object holding member, and a heat-treatment section having a second transfer member for transferring the object placed on the object holding member to a heat-treatment section for heat-treating the plurality of objects, which have undergone the coating process, in accordance with a batch process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.