Plasma processor for large workpieces
US5589737A · kind A · utility
43Cited by
12References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 6, 1994 |
| Grant date | Dec 31, 1996 |
| Priority date | — |
| Expiry date | Dec 6, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32238
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.