Patent · US Expired

Method and apparatus for x-ray analyses

US5594246A · kind A · utility

12Cited by
3References
75Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 25, 1995
Grant dateJan 14, 1997
Priority date
Expiry dateApr 25, 2015

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/2445
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An X-ray analyzing method includes the steps of applying an irradiated electron beam, converged by a condenser lens and an objective lens into a thin beam, to the inside of a fine hole existing on the surface of a sample; observing X-rays generated from a residual substance existing inside the fine hole; and performing a qualitative and quantitative analysis of the residual substance. The X-rays are observed by an X-ray detector installed in an internal space of the condenser lens, an internal space of the objective lens, or between the condenser lens and the objective lens, by detecting only the X-rays radiated within the angular range -.theta. to +.theta., where .theta. is an angle formed with a center axis of the electron beam, and so defined that tan .theta. is substantially equal to a/d, where a and d are the radius and the depth of the fine hole, respectively.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.