Method and apparatus for detecting particles on a substrate
US5608155A · kind A · utility
24Cited by
16References
39Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1995 |
| Grant date | Mar 4, 1997 |
| Priority date | — |
| Expiry date | Jun 30, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/1493
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The apparent size of sub-micron contaminant particles on a wafer surface is enlarged by selective condensation of a vapor on the particles. The substrate is located proximate to and spaced apart from a liquid vapor source which is heated. The vaporized liquid adheres to the particles, and after a predetermined period of time, condensation of vapor on the substrate is stopped, and the substrate is scanned for detecting the particles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.