Projection exposure apparatus and method with a plurality of projection optical units
US5614988A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 5, 1994 |
| Grant date | Mar 25, 1997 |
| Priority date | — |
| Expiry date | Dec 5, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus and method having a projection optical system with a plurality of projection optical units and being excellent in matching between images formed through the respective projection optical units. First and second substrates are moved relatively to a projection optical system to project a pattern formed on the first substrate through the projection optical system onto the second substrate to effect exposure thereon. The projection optical system is provided with a plurality of projection optical units each forming a real-size erect image of the pattern formed on the first substrate on the second substrate. Each of the projection optical units has a plurality of reflective surfaces and is telecentric at least on an image side. The projection exposure apparatus also has a correcting mechanism disposed to correct an error of orientation between a plurality of images formed on the second substrate by the plurality of projection optical units.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.