Plasma treatment apparatus having a workpiece-side electrode grounding circuit
US5665167A · kind A · utility
89Cited by
18References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1994 |
| Grant date | Sep 9, 1997 |
| Priority date | — |
| Expiry date | Feb 14, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0044
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A static chuck and a workpiece push-up pin are disposed on a susceptor which is one of opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected. A grounding circuit which discharges electric charges remaining on the susceptor is disposed in parallel with an RF power supply circuit which supplies RF power to the susceptor. Thus, electric charges remaining in the power supply circuit can be discharged and an abnormal discharging between the push-up pin and the susceptor can be prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.