High magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition
US5746897A · kind A · utility
30Cited by
24References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 10, 1996 |
| Grant date | May 5, 1998 |
| Priority date | — |
| Expiry date | Jul 10, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3455
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A high magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition includes a magnetron array with a plurality of magnet assemblies disposed proximate to a target. Each assembly comprises a first portion magnetized perpendicularly to the target, a second portion magnetized perpendicularly to the target and opposite the first portion, and a third portion positioned intermediate the first and second portions, the third portion magnetized parallel to the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.