Oxide strip that improves planarity
US5766971A · kind A · utility
41Cited by
9References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1996 |
| Grant date | Jun 16, 1998 |
| Priority date | — |
| Expiry date | Dec 13, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S148/05
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for stripping thin layers of oxide such as sacrificial pad oxide employs etching chemistry that widens cracks to remove shallow cracks and limit the widening of deep cracks, thereby producing a final oxide surface on thick layers of oxide that is less rough than prior art methods and enabling the fabrication of oxide-filled trenches that have geometries and/or surface smoothness that were previously impossible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.