Using ceramic wafer to protect susceptor during cleaning of a processing chamber
US5810937A · kind A · utility
19Cited by
10References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 1996 |
| Grant date | Sep 22, 1998 |
| Priority date | — |
| Expiry date | Mar 13, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for protecting a susceptor during a cleaning operation by loading a ceramic wafer onto the susceptor before introducing the cleaning agent into the chamber is provided. In particular, the ceramic wafer is chosen to have a dielectric value sufficient to alter the electromagnetic field of a plasma to spread the plasma away from the susceptor during a cleaning operation, directing more of the plasma towards the walls of the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.