Corrosion-resistant aluminum article for semiconductor processing equipment
US5811195A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 1995 |
| Grant date | Sep 22, 1998 |
| Priority date | — |
| Expiry date | Jul 10, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
We have discovered that corrosion of an aluminum article (such as a susceptor) exposed to corrosive halogen-containing species within semiconductor processing apparatus can be avoided by fabricating the article from a high purity aluminum-magnesium alloy having an optimum magnesium content. Upon exposure of the article to a halogen-containing species, a protective magnesium halide layer is formed upon or beneath the surface of the article. The protective layer prevents halogens from penetrating to the base aluminum, thereby protecting the article from corrosion and cracking. To protect the magnesium halide layer from abrasion, the article preferably also includes a hard, cohesive coating over the magnesium halide layer. A preferred cohesive coating is aluminum oxide or aluminum nitride. The magnesium content of the aluminum article, to enable formation of a magnesium halide layer, should be in the range of about 0.1% to about 6% by weight, depending on the operational temperature of the article. For temperatures greater than about 250.degree. C., the magnesium content of the aluminum article should range between about 0.1% by weight and about 1.5% by weight of the article. The magn…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.