Multiple field of view calibration plate having a reqular array of features for use in semiconductor manufacturing
US5825483A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 1995 |
| Grant date | Oct 20, 1998 |
| Priority date | — |
| Expiry date | Dec 19, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A multiple field of view calibration plate is provided both for coordinating multiple fields of view of a plurality of cameras so as to facilitate determining the distance between features on a semiconductor wafer, each feature being disposed within a different field of view, and for correcting image distortion within each field of view. The multiple field of view calibration plate is particularly suited for use in semiconductor manufacturing, and includes a substantially rigid dimensionally-stable substrate having a systematic array of features that are sized such that more than one of the features can fit within a field of view. The array is of a spatial extent such that more than one of the fields of view are substantially filled with the features. Also, the systematic assay of features is characterized by a distribution density suitable for correcting image distortion within a field of view. The systematic array can be a regular array, each feature being separated from each nearest neighboring feature by an equal distance. Alternatively, the separation between neighboring features is a function of position on the substrate, so that given the relative location of two neighboring…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.