Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus
US5845660A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 5, 1996 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | Dec 5, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.