Patent · US Expired

Vacuum processing apparatus and semiconductor manufacturing line using the same

US5855726A · kind A · utility

356Cited by
9References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 8, 1996
Grant dateJan 5, 1999
Priority date
Expiry dateJul 8, 2016

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T70/5805
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing on the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed to be larger than the width of the vacuum processing block, and the overall plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.