Electron beam emitting tungsten filament
US5864199A · kind A · utility
5Cited by
16References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 18, 1997 |
| Grant date | Jan 26, 1999 |
| Priority date | — |
| Expiry date | Aug 18, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J1/304
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Electron beam emitting filaments having a tip with a radius of curvature less than about 50 .ANG. are produced using focused ion beam milling. In one embodiment, platinum is deposited on a tungsten loop electron beam filament and sharpened using focused ion beam milling to a radius of curvature less than about 50 .ANG..
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.