Resist processing method and resist processing system
US5866307A · kind A · utility
17Cited by
1References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 1997 |
| Grant date | Feb 2, 1999 |
| Priority date | — |
| Expiry date | Sep 11, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A resist processing method for introducing a pressurized gas into a vessel storing a solution, sending the solution from the vessel to a nozzle by way of a supply line by means of the pressurized gas, and supplying the solution from the nozzle to a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.