Clamp ring for shielding a substrate during film layer deposition
US5868847A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 1994 |
| Grant date | Feb 9, 1999 |
| Priority date | — |
| Expiry date | Dec 16, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4585
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chamber for depositing a film layer on a substrate includes a support member on which the substrate is positioned for processing in the chamber, and a clamp ring suspended in the chamber on a chamber shield. The support member is positionable in the chamber to receive a substrate thereon, and further positionable to pass the substrate through the shield and thereby lift the clamp ring off the shield. After deposition is complete, the support member retracts through the shield, to reposition the clamp on the shield. In the event that a deposition material layer has formed between the substrate and the clamp ring, the clamp ring includes a plurality of actuators thereon which force the substrate out of the clamp ring as the clamp ring is repositioned on the shield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.