Apparatus for measuring pedestal temperature in a semiconductor wafer processing system
US5893643A · kind A · utility
23Cited by
5References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1997 |
| Grant date | Apr 13, 1999 |
| Priority date | — |
| Expiry date | Mar 25, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67103
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus for measuring wafer support pedestal temperature in a semiconductor wafer processing system. The apparatus measures infrared energy emitted by the bottom of the pedestal via a tube having one end inserted in a bore through the underside of the cathode pedestal base. The distal end of the tube is coupled to a temperature sensor. Both the tube and temperature sensor are fitted with insulating sleeve adapters to suppress unwanted RF signals from coupling to the sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.