Multi-zone illuminator for rapid thermal processing
US5937142A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 1996 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Jul 11, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an axisymmetrical multi-zone illuminator having a plurality of substantially concentric rings of heating lamps to direct optical power toward said substrate, a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The system also includes a multizone temperature measurement system having a plurality of pyrometry sensors coupled to said multi-zone illuminator, a system for real-time measurement and compensation of substrate emissivity and illuminator lamp light interference effects, and a multi-variable temperature controller for providing multi-zone real-time temperature control. The system also incorpotates a plurality of illuminator lamp power supplies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.