Method of producing acceleration sensors

US5937275A · kind A · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Horst Munzel · Darmstadt, DE
• Michael Offenberg · Lörrach, DE
• Klaus Heyers · Reutlingen, DE
• Bernhard Elsner · Bad Berka, DE
• Markus Lutz · Palo Alto, US
• Helmut Skapa · Reutlingen, DE
• Heinz-Georg Vossenberg · Pfullingen, DE
• Nicholas Ian Buchan · San Jose, US
• Eckhard Graf · Gomaringen, DE

Key dates

• Filing date: Oct 27, 1997
• Grant date: Aug 10, 1999
• Expiry date: Oct 27, 2017

Classification

• Technology area (CPC G): Physics
• CPC primary: G01P15/0802
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method for producing acceleration sensors is proposed, in which a silicon layer that is deposited in an epitaxial application system is used. Above sacrificial layers (2) applied to the substrate (1), the material grows in the form of a polysilicon layer (6), which has a certain surface roughness. By application of a photoresist and by a wet etching process, this surface roughness is eliminated. Alternatively, chemical-mechanical smoothing is contemplated.