Substrate treatment system
US5944894A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1997 |
| Grant date | Aug 31, 1999 |
| Priority date | — |
| Expiry date | Aug 27, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67178
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate treatment system comprises process sections provided with at least either of liquid treatment group units and heat treatment group units, an upper space formed above the process sections in order to supply air to the process sections, a purification section for removing alkaline components from the air to be supplied to the upper spaces to purify the air, temperature/humidity controller communicating with the urification section and the upper spaces to control the temperature and humidity of the air passing through the purification sections, and fans for supplying air to the top spaces from the temperature/humidity controller, lowering the air from the upper spaces into the process sections, and supplying at least some of the air lowering through the process sections to the temperature/humidity controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.