Method and apparatus for verifying the calibration of semiconductor processing equipment
US5948958A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 1998 |
| Grant date | Sep 7, 1999 |
| Priority date | — |
| Expiry date | Sep 1, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor processing equipment calibration verification procedure is provided that does not rely on pressure rises from laboratory reference chambers and that is insensitive to in-chamber variations that affect processing gas pressure rise but do not affect the underlying process. A baseline pressure rise ratio is computed based on an inert gas pressure rise and a processing gas pressure rise produced when an inert gas and a processing gas, respectively, are flowed into a processing chamber. Subsequent, preferably periodic, calibration verification procedures are performed and new pressure rise ratios are computed. When a new pressure rise ratio differs from the baseline pressure rise ratio by more than a predetermined amount, the calibration of the semiconductor processing equipment is rejected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.