High spatial resolution ellipsometry device
US5991037A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1998 |
| Grant date | Nov 23, 1999 |
| Priority date | — |
| Expiry date | Jan 27, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The ellipsometry device includes a first focusing device, combined with a first optical system, for focusing the light beam from the first optical system onto the sample, a second focusing device, combined with a second optical system, for focusing the beam reflected by the sample surface onto the input of the second optical system, and an optical correction device for correcting, together with the first and second focusing devices, the position of the focused reflected beam so as to reject the interference reflections generated by the surface of the sample opposite the light beam receiving surface, and to obtain a maximum signal level at the photodetector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.