System for cleaning residual paste from a mask
US6032683A · kind A · utility
7Cited by
11References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 1999 |
| Grant date | Mar 7, 2000 |
| Priority date | — |
| Expiry date | Feb 26, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/26
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.