Top antireflective coating film
US6057080A · kind A · utility
41Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 1997 |
| Grant date | May 2, 2000 |
| Priority date | — |
| Expiry date | Dec 9, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/3154
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antireflective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.