Patent · US Expired

Processing apparatus and method using solution

US6063439A · kind A · utility

35Cited by
1References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 5, 1998
Grant dateMay 16, 2000
Priority date
Expiry dateJun 5, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/10
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A processing apparatus using solution comprises a rotary table which rotates while holding a substrate thereon, in the processing chamber provided in the casing, a supply mechanism for supplying a processing solution to a surface of the substrate held on the rotary table, and an impurity remover unit, provided outside the casing, wherein the impurity remover unit includes a cleaning unit for cleaning an object gas introduced from the inlet opening by brining it into contact with an impurity remover solution, and the gas-liquid separation mechanism for separating liquid from gas in an exhaust is provided in the exhaust system for exhausting the casing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.