Schottky diode of SiC and a method for production thereof
US6104043A · kind A · utility
66Cited by
0References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 1997 |
| Grant date | Aug 15, 2000 |
| Priority date | — |
| Expiry date | Feb 20, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D8/60
Abstract
A Schottky diode of SiC has a substrate layer, a drift layer and emitter layer regions formed in the drift layer. A metal layer makes an ohmic contact to the emitter layer regions and Schottky contact to the drift layer. A depletion of the drift layer region between two adjacent emitter layer regions is allowed in the blocking state of the diode making the two adjacent p-type emitter layer regions form a continuous depleted region therebetween in this state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.