Patent · US Expired

Schottky diode of SiC and a method for production thereof

US6104043A · kind A · utility

66Cited by
0References
10Claims
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Assignee

Inventors

Key dates

Filing dateFeb 20, 1997
Grant dateAug 15, 2000
Priority date
Expiry dateFeb 20, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D8/60

Abstract

A Schottky diode of SiC has a substrate layer, a drift layer and emitter layer regions formed in the drift layer. A metal layer makes an ohmic contact to the emitter layer regions and Schottky contact to the drift layer. A depletion of the drift layer region between two adjacent emitter layer regions is allowed in the blocking state of the diode making the two adjacent p-type emitter layer regions form a continuous depleted region therebetween in this state.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.