Deposition resistant lining for CVD chamber
US6117244A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1998 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Mar 24, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/916
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition resistant lining assembly is provided for a chemical vapor deposition chamber, the deposition resistant lining assembly including a first ceramic liner for mounting adjacent a substrate holder within the chemical vapor deposition chamber to protect a portion of an interior wall of the chemical vapor deposition chamber from deposition of material on the portion of said interior wall of the chemical vapor deposition chamber. The deposition resistant lining assembly also includes a second ceramic liner for mounting in a pumping channel formed in a peripheral region of the chemical vapor deposition chamber to protect a portion of said pumping channel from deposition of the material on the portion of the pumping channel. The first ceramic liner and the second ceramic liner are more resistant to deposition of the material than aluminum and easier and faster to clean of the material deposited thereon than aluminum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.