Thanh Pham
24Patents
12h-index
34Co-inventors
81Inventor score
Filing activity: Feb 3, 1994 → Sep 16, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7399388B2 | Sequential gas flow oxide deposition technique | Chemistry; Metallurgy | 592 | Expired |
| US5866795A | Liquid flow rate estimation and verification by direct liquid measurement | Physics | 485 | Expired |
| US6110556A | Lid assembly for a process chamber employing asymmetric flow geometries | Emerging Cross-Sectional Technologies | 163 | Expired |
| US6903031B2 | In-situ-etch-assisted HDP deposition using SiF4 and hydrogen | Electricity | 93 | Expired |
| US7081414B2 | Deposition-selective etch-deposition process for dielectric film gapfill | Electricity | 86 | Expired |
| US6117244A | Deposition resistant lining for CVD chamber | Emerging Cross-Sectional Technologies | 78 | Expired |
| US7097886B2 | Deposition process for high aspect ratio trenches | Electricity | 36 | Expired |
| US7479304B2 | Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate | Emerging Cross-Sectional Technologies | 34 | Expired |
| US7033945B2 | Gap filling with a composite layer | Electricity | 32 | Expired |
| US5968588A | In-situ liquid flow rate estimation and verification by sonic flow method | Chemistry; Metallurgy | 24 | Expired |
| US6511923B1 | Deposition of stable dielectric films | Electricity | 19 | Expired |
| US5707451A | Method and apparatus for cleaning a throttle valve | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5871813A | Apparatus and method for controlling process chamber pressure | Performing Operations; Transporting | 10 | Expired |
| US7141138B2 | Gas delivery system for semiconductor processing | Electricity | 9 | Expired |
| US6047713A | Method for cleaning a throttle valve | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6012600A | Pressure responsive clamp for a processing chamber | Electricity | 5 | Expired |
| US7049211B2 | In-situ-etch-assisted HDP deposition using SiF4 | Electricity | 3 | Expired |
| US7294588B2 | In-situ-etch-assisted HDP deposition | Electricity | 3 | Active |
| US7691753B2 | Deposition-selective etch-deposition process for dielectric film gapfill | Electricity | 2 | Active |
| US7799698B2 | Deposition-selective etch-deposition process for dielectric film gapfill | Electricity | 2 | Active |
| US10205038B2 | Photovoltaic devices including curved sub-layers | Emerging Cross-Sectional Technologies | 0 | Active |
| US10424687B1 | Methods of producing uniform intrinsic layer | Emerging Cross-Sectional Technologies | 0 | Active |
| US7498268B2 | Gas delivery system for semiconductor processing | Electricity | 0 | Active |
| US9972743B1 | Methods of producing photoelectric devices | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.