Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions
US6121161A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 1999 |
| Grant date | Sep 19, 2000 |
| Priority date | — |
| Expiry date | Jan 19, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4404
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for controlling the introduction of contaminates into a deposition chamber that occur naturally within the chamber components. The CVD chamber is "seasoned" with a protective layer after a dry clean operation and before a substrate is introduced into the chamber. The deposited seasoning layer has a lower diffusion rate for typical contaminants in relation to the chamber component materials and covers the chamber component, reducing the likelihood that the naturally occurring contaminants will interfere with subsequent processing steps. After deposition of the seasoning layer is complete, the chamber is used for one to n substrate deposition steps before being cleaned by another clean operation as described above and then reseasoned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.