Ester compounds, polymers, resist composition and patterning process
US6147249A · kind A · utility
62Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 1999 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | May 10, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.