Method for automatically cleaning resist nozzle
US6170494A · kind A · utility
13Cited by
14References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2000 |
| Grant date | Jan 9, 2001 |
| Priority date | — |
| Expiry date | Feb 22, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.