Vincent L. Marinaro
13Patents
5h-index
4Co-inventors
48Inventor score
Filing activity: Jun 18, 1999 → Jan 16, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6245584A | Method for detecting adjustment error in photolithographic stepping printer | Electricity | 52 | Expired |
| US6051348A | Method for detecting malfunction in photolithographic fabrication track | Physics | 49 | Expired |
| US6648201B1 | Apparatus to reduce wasting of unused photoresist in semiconductor containers | Performing Operations; Transporting | 26 | Expired |
| US6170494A | Method for automatically cleaning resist nozzle | Physics | 13 | Expired |
| US6318913A | Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer | Performing Operations; Transporting | 8 | Expired |
| US6418946B1 | Apparatus for automatically cleaning resist nozzle | Physics | 5 | Expired |
| US6481277B1 | Temperature control unit and sight glass | Physics | 3 | Expired |
| US6238747A | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Physics | 2 | Expired |
| US6250822A | Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer | Performing Operations; Transporting | 2 | Expired |
| US6082379A | Mechanism for cleaning an integrated circuit wafer hot plate while the hot plate is at operating temperature | Performing Operations; Transporting | 1 | Expired |
| US6361599B1 | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Physics | 1 | Expired |
| US6176274A | Method and system for measuring fluid volume in a photolithography track | Physics | 0 | Expired |
| US6299688A | Developer nozzle clean combs | Performing Operations; Transporting | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.