Resist processing system having process solution deaeration mechanism
US6217657A · kind A · utility
21Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1998 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Oct 21, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A resist processing system includes a sensor connected for detecting the surface level of the processing solution contained in an intermediate tank, and a controller connected for controlling the fluid pressure on the basis of the surface level detected by the sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.