Apparatus for providing RF return current path control in a semiconductor wafer processing system
US6221221A · kind A · utility
62Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 1998 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | Nov 16, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32577
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus providing a low impedance RF return current path between a shield member and a pedestal in a semiconductor wafer processing chamber. The return path reduces RF voltage drop between the shield member and the pedestal during processing. The return path comprises a conductive strap connected to the pedestal and a conductive bar attached to the strap. A toroidal spring makes multiple parallel electrical connections between the conductive bar and the shield member. A support assembly, attached to a collar on the chamber wall, supports the conductive bar.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.