Fractal filter applied to a contamination-free manufacturing signal to improve signal-to-noise ratios
US6242273A · kind A · utility
15Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1999 |
| Grant date | Jun 5, 2001 |
| Priority date | — |
| Expiry date | Sep 29, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method is provided for manufacturing, the method including processing a workpiece in a processing step and detecting defect data after the processing of the workpiece in the processing step has begun. The method also includes filtering the defect data using a fractal filter and forming an output signal corresponding to at least one type of defect based on the fractally filtered defect data. The method further includes feeding back a control signal based on the output signal to adjust the processing performed in the processing step to reduce the at least one type of defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.