Active shield for generating a plasma for sputtering
US6254737A · kind A · utility
13Cited by
59References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 8, 1996 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | Oct 8, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3327
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A combination coil and shield for a plasma chamber in a semiconductor fabrication system is provided. The coil-shield has a plurality of turns to couple energy efficiently into a plasma and also substantially blocks deposition material from reaching a second shield positioned behind the first shield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.